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High Aspect Ratio
High-aspect ratio probes are based on Veeco technology and made from Veeco TESP probes using focused ion beam milling techniques. The HAR process modifies the last 1.5um of the tip to an apsect ratio of at least 5:1. These probes are ideal for TappingMode imaging on samples with tall/ deep geometries, such as semiconductor trench imaging.
Frequency
Nom: 320KHz
Spring Const.
Nom: 40N/m
Geometry
Rectangular
Tip Radius
10nmMaterial
0.01 - 0.025 Ωcm Antimony (n) doped Si
Frequency
Nom: 320KHz
Spring Const.
Nom: 42N/m
Geometry
Rectangular
Tip Radius
10nmMaterial
0.01 - 0.025 Ωcm Antimony (n) doped SiCoating
B: Reflective Aluminum