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SSRM-SMPL-OX
Price: $2,100.00 (USD)
Questions? Free, Online Consulting
Overview
Unmounted Oxide sample.
PLEASE NOTE: Sample cross-sectioning by cleaving or polishing is required.
Resolution Qualification Structure – RQ04
The imec CAMS resolution qualification structures consist of a thin uniform layer of SiO2 confined between highly-doped grown poly-Si and implanted Si. The RQ04 standard has an average thickness of 0.4±0.1nm and is ideally suited to determine the resolution of electrical probes or for imaging techniques such as Scanning Electron Microscopy.
Works best with SSRM-DIA probes. n-type staircase (SSRM-SMPL-N) and p-type staircase (SSRM-SMPL-P) also available separately.
PLEASE NOTE: Sample cross-sectioning by cleaving or polishing is required.
Resolution Qualification Structure – RQ04
The imec CAMS resolution qualification structures consist of a thin uniform layer of SiO2 confined between highly-doped grown poly-Si and implanted Si. The RQ04 standard has an average thickness of 0.4±0.1nm and is ideally suited to determine the resolution of electrical probes or for imaging techniques such as Scanning Electron Microscopy.
Works best with SSRM-DIA probes. n-type staircase (SSRM-SMPL-N) and p-type staircase (SSRM-SMPL-P) also available separately.